Pas Normal Studios Mechanism Stow Away JacketBlack

The concept behind Copenhagen-based Pas Normal Studios is to create cutting-edge technical apparel combined with fashion-conscious aesthetics. Sleek and minimal in its design, the Mechanism Stow Away Jacket can be easily packed away in your pocket for protection against sudden changes in weather. DWR-treated Japanese nylon acts as a fast-drying membrane to keep you dry and warm, whilst a silicone gripper at the rear deflects road spray. Finished off with printed branding at the chest and back, you won’t want to head on a ride without it.

• 100% Japanese Nylon
• Non-Fluorinated DWR Fabric Treatment
• Silicone Gripper
• Quick-Drying
• Printed Branding
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